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dc.contributor.authorHigashino, Shotaen
dc.contributor.authorMiyake, Masaoen
dc.contributor.authorFujii, Hisashien
dc.contributor.authorTakahashi, Ayumuen
dc.contributor.authorHirato, Tetujien
dc.contributor.alternative東野, 昭太ja
dc.contributor.alternative三宅, 正男ja
dc.contributor.alternative藤井, 久史ja
dc.contributor.alternative高橋, 歩ja
dc.contributor.alternative平藤, 哲司ja
dc.date.accessioned2018-11-30T07:52:49Z-
dc.date.available2018-11-30T07:52:49Z-
dc.date.issued2017-
dc.identifier.issn1945-7111-
dc.identifier.urihttp://hdl.handle.net/2433/235491-
dc.description.abstractThe electrodeposition of Al-W alloy films in a Lewis acidic 1-ethyl-3-methyl-imidazolium chloride (EMIC)-AlCl₃ ionic liquid using W₆Cl₁₂ as the W ion source was investigated. W₆Cl₁₂ dissolved in the ionic liquid at a higher concentration than other W ion sources used in previous studies. Potentiostatic electrodeposition was performed in a bath containing W₆Cl₁₂ at a concentration of 49 mM. Dense Al-W alloy films containing up to 12 at.% W were electrodeposited at potentials more negative than 0 V vs. Al/Al(III). The deposition current density at >0 V was lower than 0.3 mA cm⁻², while that for Al-W alloy films was higher and reached 38 mA cm⁻² at -0.5 V. The deposition of W was induced by the deposition of Al. At lower W concentrations, the Al-W alloy films were composed of a super-saturated solid solution, and in the W content range of 9-12 at.% they comprised an amorphous phase. Potentiodynamic polarization and nano-indentation showed that the Al-W alloy films containing 10-12 at.% W exhibited high pitting corrosion resistance, high hardness, and low Young's modulus.en
dc.format.mimetypeapplication/pdf-
dc.language.isoeng-
dc.publisherElectrochemical Society Inc.en
dc.rights© The Author(s) 2017. Published by ECS. This is an open access article distributed under the terms of the Creative Commons Attribution Non-Commercial No Derivatives 4.0 License (CC BY-NC-ND, http://creativecommons.org/licenses/by-nc-nd/4.0/), which permits non-commercial reuse, distribution, and reproduction in any medium, provided the original work is not changed in any way and is properly cited. For permission for commercial reuse, please email: oa@electrochem.org.en
dc.subjectElectroplatingen
dc.titleElectrodeposition of Al-W alloy films in a 1-ethyl-3-methyl-imidazolium chloride-AlCl₃ ionic liquid containing W₆Cl₁₂en
dc.typejournal article-
dc.type.niitypeJournal Article-
dc.identifier.jtitleJournal of the Electrochemical Societyen
dc.identifier.volume164-
dc.identifier.issue4-
dc.identifier.spageD120-
dc.identifier.epageD125-
dc.relation.doi10.1149/2.0131704jes-
dc.textversionpublisher-
dc.addressGraduate School of Energy Science, Kyoto Universityen
dc.addressGraduate School of Energy Science, Kyoto Universityen
dc.addressGraduate School of Energy Science, Kyoto Universityen
dc.addressGraduate School of Energy Science, Kyoto Universityen
dc.addressGraduate School of Energy Science, Kyoto Universityen
dcterms.accessRightsopen access-
datacite.awardNumber25630327-
jpcoar.funderName日本学術振興会ja
jpcoar.funderName.alternativeJapan Society for the Promotion of Science (JSPS)en
出現コレクション:学術雑誌掲載論文等

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