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Title: Reduction of doping and trap concentrations in 4H-SiC epitaxial layers grown by chemical vapor deposition
Authors: Kimoto, Tsunenobu  kyouindb  KAKEN_id  orcid https://orcid.org/0000-0002-6649-2090 (unconfirmed)
Nakazawa, Satoshi
Hashimoto, Koichi
Matsunami, Hiroyuki
Issue Date: 22-Oct-2001
Publisher: American Institute of Physics
Citation: T. Kimoto et al., Appl. Phys. Lett. 79, 2761-2763 (2001)
Journal title: Applied Physics Letters
Volume: 79
Issue: 17
Start page: 2761
End page: 2763
Rights: Copyright 2001 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.
URI: http://hdl.handle.net/2433/24206
DOI(Published Version): 10.1063/1.1413724
Link: Web of Science
Related Link: http://link.aip.org/link/?apl/79/2761
Appears in Collections:Journal Articles

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