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タイトル: | Optimization of electrolysis conditions for Ti film electrodeposition from water-soluble KF–KCl molten salts |
著者: | Norikawa, Yutaro https://orcid.org/0000-0002-0861-5443 (unconfirmed) Yasuda, Kouji Nohira, Toshiyuki https://orcid.org/0000-0002-4053-554X (unconfirmed) |
著者名の別形: | 法川, 勇太郎 安田, 幸司 野平, 俊之 |
キーワード: | Electrodeposition Molten Salts - High temperature molten salts Electrodeposition Molten salt Titanium |
発行日: | 2019 |
出版者: | Electrochemical Society Inc. |
誌名: | Journal of the Electrochemical Society |
巻: | 166 |
号: | 14 |
開始ページ: | D755 |
終了ページ: | D759 |
抄録: | Optimized conditions for Ti film electrodeposition were investigated in water-soluble KF–KCl (45:55 mol%) molten salt at 923 K. K₃TiF₆ was prepared in the melt via a comproportionation reaction between K₂TiF₆ and Ti sponges. The K₃TiF₆ solubility was determined to be 1.48 mol%. Galvanostatic electrolysis was conducted on Ni plate substrates at various K₃TiF₆ concentrations (0.28, 0.70, and 1.43 mol%) and current densities (25–150 mA cm⁻²). Surface and cross-sectional scanning electron microscopy observations showed that adherent, compact, and smooth Ti films were obtained at higher K₃TiF₆ concentrations and lower current densities. A corrosion test was conducted for the Ti-coated Ni plate using linear sweep voltammetry, which showed that the Ti films have no cracks or voids. |
著作権等: | © The Author(s) 2019. Published by ECS. This is an open access article distributed under the terms of the Creative Commons Attribution Non-Commercial No Derivatives 4.0 License (CC BY-NC-ND, http://creativecommons.org/licenses/by-nc-nd/4.0/), which permits non-commercial reuse, distribution, and reproduction in any medium, provided the original work is not changed in any way and is properly cited. For permission for commercial reuse, please email: oa@electrochem.org. |
URI: | http://hdl.handle.net/2433/244715 |
DOI(出版社版): | 10.1149/2.1291914jes |
出現コレクション: | 学術雑誌掲載論文等 |
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