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dc.contributor.authorNorikawa, Yutaroen
dc.contributor.authorYasuda, Koujien
dc.contributor.authorNohira, Toshiyukien
dc.contributor.alternative法川, 勇太郎ja
dc.contributor.alternative安田, 幸司ja
dc.contributor.alternative野平 俊之ja
dc.description6th Asian Conference on Molten Salt Chemistry and Technology, Gyeongju, Korea, 13-16 June, 2017, presentation OA02 (2017).en
dc.description.abstractElectrodeposition of metallic Ti using water-soluble KF–KCl molten salt electrolyte was investigated. Ti films were electrodeposited on Ni substrate in a eutectic KF–KCl (45:55 mol%) melt containing K₂ TiF₆ and Ti sponge at 923 K. Cyclic voltammetry suggested the deposition of Ti metal at the potential more negative than 0.4 V (vs. K⁺/K) and the redox reaction of Ti(IV)/Ti(III) around 1.8 V. The analytical results of SEM, EDX and XRD revealed that dense and smooth film of Ti metal with 30 μm thickness was electrodeposited by galvanostatic electrolysis at current density of 100 mA cm⁻² for 25 min.en
dc.titleA New Electrodeposition Process of Metallic Ti Films Utilizing Water-soluble KF–KCl Molten Saltsen
dc.typeconference paper-
dc.type.niitypeConference Paper-
dc.identifier.jtitleProceeding of 6th Asian Conference on Molten Salt Chemistry and Technology-
dc.identifier.artnumpresentation OA02-
dc.addressInstitute of Advanced Energy, Kyoto Universityen
dc.addressAgency for Health, Safety and Environment, Kyoto University・Department of Fundamental Energy Science, Graduate School of Energy Science, Kyoto Universityen
dc.addressInstitute of Advanced Energy, Kyoto Universityen
dcterms.accessRightsopen access-
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