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Title: A New Electrodeposition Process of Metallic Ti Films Utilizing Water-soluble KF–KCl Molten Salts
Authors: Norikawa, Yutaro
Yasuda, Kouji
Nohira, Toshiyuki  kyouindb  KAKEN_id  orcid (unconfirmed)
Author's alias: 法川, 勇太郎
安田, 幸司
野平 俊之
Issue Date: Jun-2017
Publisher: 電気化学会
Journal title: Proceeding of 6th Asian Conference on Molten Salt Chemistry and Technology
Thesis number: presentation OA02
Abstract: Electrodeposition of metallic Ti using water-soluble KF–KCl molten salt electrolyte was investigated. Ti films were electrodeposited on Ni substrate in a eutectic KF–KCl (45:55 mol%) melt containing K₂ TiF₆ and Ti sponge at 923 K. Cyclic voltammetry suggested the deposition of Ti metal at the potential more negative than 0.4 V (vs. K⁺/K) and the redox reaction of Ti(IV)/Ti(III) around 1.8 V. The analytical results of SEM, EDX and XRD revealed that dense and smooth film of Ti metal with 30 μm thickness was electrodeposited by galvanostatic electrolysis at current density of 100 mA cm⁻² for 25 min.
Description: 6th Asian Conference on Molten Salt Chemistry and Technology, Gyeongju, Korea, 13-16 June, 2017, presentation OA02 (2017).
Rights: 発行元の許可を得て掲載しています。
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