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タイトル: | Electrodeposition of Tungsten from Molten KF–KCl–WO3 and CsF–CsCl–WO3 |
著者: | Nohira, Toshiyuki https://orcid.org/0000-0002-4053-554X (unconfirmed) Ide, Tatsuya Meng, Xianduo Norikawa, Yutaro https://orcid.org/0000-0002-0861-5443 (unconfirmed) Yasuda, Kouji |
著者名の別形: | 野平, 俊之 井手, 達也 法川, 勇太郎 安田, 幸司 |
発行日: | 7-Apr-2021 |
出版者: | The Electrochemical Society |
誌名: | Journal of The Electrochemical Society |
巻: | 168 |
号: | 4 |
論文番号: | 046505 |
抄録: | Electrodeposition of W coatings in KF–KCl eutectic melts was investigated after adding 0.5–2.0 mol% of WO3 at 923 K. Cyclic voltammetry at a Ag electrode suggested that the electrodeposition of W from W(VI) ions proceeds from 1.65 V vs K+/K. Electrodeposition of the α-W phase was confirmed by X-ray diffractometry (XRD). The effects of current density and amount of WO3 on the morphology of W coatings were investigated by surface and cross-sectional scanning electron microscopy (SEM). The smoothest W coating with a thickness of ~15 μm was formed at 12.5 mA cm−2 and 2.0 mol% WO3 in KF–KCl eutectic melts. By increasing the charge density, a coating thickness of ~30 μm was attained; however, it significantly increased the surface roughness of the coating. The electrodeposition of W was also performed in CsF–CsCl eutectic melts at a lower temperature of 873 K to suppress the growth of crystal grains. XRD confirmed the existence of both α-W and β-W phases in the W coatings deposited in the CsF–CsCl eutectic melts. SEM analyses revealed the successful formation of dense and smooth W coatings with ~30 μm thickness in the CsF–CsCl eutectic melts. |
著作権等: | © 2021 The Author(s). Published on behalf of The Electrochemical Society by IOP Publishing Limited. This is an open access article distributed under the terms of the Creative Commons Attribution Non-Commercial No Derivatives 4.0 License, which permits non-commercial reuse, distribution, and reproduction in any medium, provided the original work is not changed in any way and is properly cited. For permission for commercial reuse, please email: permissions@ioppublishing.org. |
URI: | http://hdl.handle.net/2433/264251 |
DOI(出版社版): | 10.1149/1945-7111/abf266 |
出現コレクション: | 学術雑誌掲載論文等 |
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