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Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Negoro, Y | en |
dc.contributor.author | Kimoto, T | en |
dc.contributor.author | Matsunami, H | en |
dc.date.accessioned | 2007-03-28T03:33:09Z | - |
dc.date.available | 2007-03-28T03:33:09Z | - |
dc.date.issued | 2005 | - |
dc.identifier.issn | 0255-5476 | - |
dc.identifier.uri | http://hdl.handle.net/2433/8843 | - |
dc.language.iso | eng | - |
dc.publisher | TRANS TECH PUBLICATIONS LTD | en |
dc.subject | implantation | en |
dc.subject | device process | en |
dc.subject | annealing | en |
dc.subject | diffusion | en |
dc.subject | (11-20) face | en |
dc.subject | graphite cap | en |
dc.title | Technological aspects of ion implantation in SiC device processes | en |
dc.type | journal article | - |
dc.type.niitype | Journal Article | - |
dc.identifier.jtitle | SILICON CARBIDE AND RELATED MATERIALS 2004 | en |
dc.identifier.volume | 483 | - |
dc.identifier.spage | 599 | - |
dc.identifier.epage | 604 | - |
dc.textversion | none | - |
dcterms.accessRights | metadata only access | - |
Appears in Collections: | Graduate School of Engineering Literature Database |
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