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| 書誌情報 | ファイル |
|---|---|
| Rapid production of silicon-containing vapor grown carbon fibers using the liquid pulse injection technique Mukai, SR; Masuda, T; Harada, T; Hashimoto, K (2000) CARBON, 38(13): 1801-1805 | |
| Quantum chemical study of aluminum CVD reaction for titanium nitride (111) surface with terminal fluorine Tachibana, A; Nakamura, K (2000) JOURNAL OF MOLECULAR STRUCTURE-THEOCHEM, 506: 273-286 | |
| 4H-SiC (11(2)over-bar-0) epitaxial growth Kimoto, T; Yamamoto, T; Chen, ZY; Yano, H; Matsunami, H (2000) SILICON CARBIDE AND RELATED MATERIALS - 1999 PTS, 1 & 2, 338-3: 189-192 | |
| Physical properties of rapidly grown vapor-grown carbon fibers Mukai, SR; Masuda, T; Hashimoto, K; Iwanaga, H (2000) CARBON, 38(3): 491-494 | |
| Numerical analysis method for growth kinetics of chemical vapor deposition of alumina using a non-isothermal CVD reactor Tago, T; Kawase, M; Hashimoto, K (2000) KAGAKU KOGAKU RONBUNSHU, 26(6): 763-769 |