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j.electacta.2014.06.044.pdf | 170.42 kB | Adobe PDF | 見る/開く |
タイトル: | Electrodeposition of Aluminum from 1,3-Dimethyl-2-Imidazolidinone/AlCl₃ baths |
著者: | Endo, Atsushi Miyake, Masao https://orcid.org/0000-0001-8208-4030 (unconfirmed) Hirato, Tetsuji https://orcid.org/0000-0003-3030-1632 (unconfirmed) |
著者名の別形: | 遠藤, 厚志 三宅, 正男 平藤, 哲司 |
キーワード: | Electroplating Electrodeposition Organic solvent bath |
発行日: | 10-Aug-2014 |
出版者: | Elsevier Ltd. |
誌名: | Electrochimica Acta |
巻: | 137 |
開始ページ: | 470 |
終了ページ: | 475 |
抄録: | This study investigated the use of novel organic solvent baths for the electrodeposition of aluminum at near-ambient temperatures. It was found that Al metal can be electrodeposited from baths that were composed of 1, 3-dimethyl-2-imidazolidinone (DMI) and AlCl₃, with an AlCl₃ concentration greater than 50 mol%. IR spectroscopy indicated that Al₂Cl₇⁻ions were present in the baths that contained >50 mol% AlCl₃, where the electrodeposition of Al occurs from Al₂Cl₇⁻ion. The DMI/AlCl₃ baths with AlCl₃ concentrations between 59 and 64 mol% retained a single liquid phase without precipitation at 25 ℃, and therefore, they can be used for Al electrodeposition near room temperature. Smooth Al films could be obtained by galvanostatic electrodeposition at 40 ℃ using a DMI/AlCl₃ bath with the addition of a trace amount of 1, 10-phenanthroline. |
著作権等: | © 2014. This manuscript version is made available under the CC-BY-NC-ND 4.0 license http://creativecommons.org/licenses/by-nc-nd/4.0/. The full-text file will be made open to the public on 10 August 2016 in accordance with publisher's 'Terms and Conditions for Self-Archiving' この論文は出版社版でありません。引用の際には出版社版をご確認ご利用ください。 This is not the published version. Please cite only the published version. |
URI: | http://hdl.handle.net/2433/237635 |
DOI(出版社版): | 10.1016/j.electacta.2014.06.044 |
出現コレクション: | 学術雑誌掲載論文等 |
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