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書誌情報ファイル
Low sheet resistance of high-dose aluminum implanted 4H-SiC using (11-20) face
  Negoro, Y; Katsumoto, K; Kimoto, T; Matsunami, H; Schmid, F; Pensl, G (2004)
  SILICON CARBIDE AND RELATED MATERIALS 2003, PTS 1 AND 2, 457-460: 913-916
Electrical behavior of implanted aluminum and boron near tall region in 4H-SiC after high-temperature annealing
  Negoro, Y; Kimoto, T; Matsunami, H (2005)
  SILICON CARBIDE AND RELATED MATERIALS 2004, 483: 617-620
Carrier compensation near tail region in aluminum- or boron-implanted 4H-SiC(0001)
  Negoro, Y; Kimoto, T; Matsunami, H (2005-08-15)
  Journal of Applied Physics, 98(4)
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