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| 書誌情報 | ファイル |
|---|---|
| Characterization of Plasma Process-Induced Latent Defects in Surface and Interface Layer of Si Substrate Nakakubo, Yoshinori; Eriguchi, Koji; Ono, Kouichi (2015-02-14) ECS Journal of Solid State Science and Technology, 4(6): N5077-N5083 |  |
| Influence of uniaxial mechanical stress on the high frequency performance of metal-oxide-semiconductor field effect transistors on (100) Si wafer Han, Younggun; Koganemaru, Masaaki; Ikeda, Toru; Miyazaki, Noriyuki; Choi, Woon; Tomokage, Hajime (2010) APPLIED PHYSICS LETTERS, 96(21) | |
| Influence of uniaxial mechanical stress on the high frequency performance of metal-oxide-semiconductor field effect transistors on (100) Si wafer Han, Younggun; Koganemaru, Masaaki; Ikeda, Toru; Miyazaki, Noriyuki; Choi, Woon; Tomokage, Hajime (2010-05) APPLIED PHYSICS LETTERS, 96(21) | |