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書誌情報ファイル
Film precursor formation in metalorganic chemical vapor deposition of barium strontium titanate films: A study by microdischarge optical emission spectroscopy
  Momose, S; Nakamura, T; Tachibana, K (2002)
  JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 41(2A): 778-783
Ab initio calculations of the dissociative attachment resonance energies for an octafluorocyclopentene molecule with comparisons to electron attachment mass spectrometric measurements
  Nakamura, T; Tachibana, K (2002)
  APPLIED PHYSICS LETTERS, 80(21): 3904-3906
Ab initio calculations of the dissociative attachment resonance energies for an octafluorocyclopentene molecule with comparisons to electron attachment mass spectrometric measurements
  Nakamura, T; Tachibana, K (2002-05-27)
  APPLIED PHYSICS LETTERS, 80(21): 3904-3906
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Effects of O-2 gas on reaction mechanisms in the chemical vapor deposition of (Ba,Sr)TiO3 thin film
  Yamamuka, M; Momose, S; Nakamura, T; Tachibana, K; Takada, H (2002)
  JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 41(4A): 2231-2240
Reaction mechanism of alkoxy derivatives of titanium diketonates as source molecules in liquid source metalorganic chemical vapor deposition of (Ba,Sr)TiO3 films: A study by in situ infrared absorption spectroscopy
  Nakamura, T; Momose, S; Sahara, R; Tachibana, K (2002)
  JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 41(11B): 6624-6627

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