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書誌情報ファイル
Epitaxial growth of 4H-SiC(0 3 (3)over-bar 8) and control of MOS interface
  Kimoto, T; Hirao, T; Fujihira, K; Kosugi, H; Danno, K; Matsunami, H (2003)
  APPLIED SURFACE SCIENCE, 216(1-4): 497-501
Hetero-interface properties of SiO2/4H-SiC on various crystal orientations
  Matsunami, H; Kimoto, T; Yano, H (2003)
  IEICE TRANSACTIONS ON ELECTRONICS, E86C(10): 1943-1948
Interface properties of metal-oxide-semiconductor structures on 4H-SiC{0001} and (112(-)over-bar) formed by N2O oxidation
  Kimoto, T; Kanzaki, Y; Noborio, M; Kawano, H; Matsunami, H (2005)
  JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 44(3): 1213-1218