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書誌情報ファイル
Phosphorus ion implantation into 4H-SiC (0001) and (11(2)over-bar0)
  Negoro, Y; Miyamoto, N; Kimoto, T; Matsunami, H (2002)
  SILICON CARBIDE AND RELATED MATERIALS 2001, PTS 1 AND 2, PROCEEDINGS, 389-3: 783-786
Electrical activation of high-concentration aluminum implanted in 4H-SiC
  Negoro, Y; Kimoto, T; Matsunami, H; Schmid, F; Pensl, G (2004)
  JOURNAL OF APPLIED PHYSICS, 96(9): 4916-4922
Defect formation in (0001)- and (1120)-oriented 4H-SiC crystals P+-Implanted at room temperature
  Okada, T; Negoro, Y; Kimoto, T; Okamoto, K; Kujime, N; Tanaka, N; Matsunami, H (2004)
  JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 43(10): 6884-6889
Stability of deep centers in 4H-SiC epitaxial layers during thermal annealing
  Negoro, Y; Kimoto, T; Matsunami, H (2004)
  APPLIED PHYSICS LETTERS, 85(10): 1716-1718
Carrier compensation near tail region in aluminum- or boron-implanted 4H-SiC(0001)
  Negoro, Y; Kimoto, T; Matsunami, H (2005)
  JOURNAL OF APPLIED PHYSICS, 98(4)
Recent progress in SiC epitaxial growth and device processing technology
  Kimoto, T; Yano, H; Tamura, S; Miyamoto, N; Fujihira, K; Negoro, Y; Matsunami, H (2000)
  SILICON CARBIDE AND RELATED MATERIALS, ECSCRM2000, 353-3: 543-548
Electronic behaviors of high-dose phosphorus-ion implanted 4H-SiC(0001)
  Negoro, Y; Katsumoto, K; Kimoto, T; Matsunami, H (2004)
  JOURNAL OF APPLIED PHYSICS, 96(1): 224-228
High-voltage SiC pn diodes with avalanche breakdown fabricated by aluminum or boron ion implantation
  Negoro, Y; Miyamoto, N; Kimoto, T; Matsunami, H (2002)
  SILICON CARBIDE AND RELATED MATERIALS 2001, PTS 1 AND 2, PROCEEDINGS, 389-3: 1273-1276
Robust 4H-SiC pn diodes fabricated using (1120) face
  Negoro, Y; Kimoto, T; Matsunami, H (2004)
  JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 43(2): 471-476
Embedded epitaxial growth of 4H-SiC on trenched substrates and pn junction characteristics
  Negoro, Y; Kimoto, T; Kataoka, M; Takeuchi, Y; Malhan, RK; Matsunami, H (2006)
  MICROELECTRONIC ENGINEERING, 83(1): 27-29