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書誌情報	ファイル
Composition control of manganite perovskites in metalorganic chemical vapor deposition with in situ spectroscopic monitoring Nakamura, T; Tai, R; Nishimura, T; Tachibana, K (2005) JOURNAL OF APPLIED PHYSICS, 97(10)
Diagnosis of oxidation reactions in metalorganic chemical vapor deposition of (Ba,Sr)TiO3 films by in situ Fourier transform infrared spectroscopy Momose, S; Sahara, R; Nakamura, T; Tachibana, K (2001) JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 40(9B): 5501-5506
Quantum chemical study on chemical vapor deposition source molecules for the deposition of (Ba,Sr)TiO3 films: Infrared band identifications by density functional calculations Nakamura, T; Tachibana, K (2001) JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 40(1): 338-345
Effects of gas-phase thermal decompositions of chemical vapor deposition source molecules on the deposition of (Ba, Sr)TiO3 films: A study by in situ Fourier transform infared spectroscopy Momose, S; Nakamura, T; Tachibana, K (2000) JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 39(9B): 5384-5388
Reaction mechanism of alkoxy derivatives of titanium diketonates as source molecules in liquid source metalorganic chemical vapor deposition of (Ba,Sr)TiO3 films: A study by in situ infrared absorption spectroscopy Nakamura, T; Momose, S; Sahara, R; Tachibana, K (2002) JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 41(11B): 6624-6627
Microdischarge optical emission spectroscopy as a novel diagnostic tool for metalorganic chemical vapor deposition of (Ba,Sr)TiO3 films Momose, S; Nakamura, T; Tachibana, K (2000) JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 39(2A): 555-559
Metalorganic chemical vapor deposition of magnetoresistive manganite films exhibiting electric-pulse-induced resistance change effect Nakamura, T; Tai, R; Tachibana, K (2006) JOURNAL OF APPLIED PHYSICS, 99(8)
Formation mechanism of strontium and titanium oxide films by metalorganic chemical vapor deposition: An isotopic labeling study using O-18(2) Nakamura, T; Momose, S; Tachibana, K (2001) JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 40(11): 6619-6622
Radical kinetics for polymer film deposition in fluorocarbon (C4F8, C3F6 and C5F8) plasmas Takahashi, K; Itoh, A; Nakamura, T; Tachibana, K (2000) THIN SOLID FILMS, 374(2): 303-310
Plasma copolymerization of C6F6/C5F8 for application of low-dielectric-constant fluorinated amorphous carbon films and its gas-phase diagnostics using in situ Fourier transform infrared spectroscopy Shirafuji, T; Tsuchino, A; Nakamura, T; Tachibana, K (2004) JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 43(5A): 2697-2703