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書誌情報	ファイル
Formation of a photocatalytic WO3 surface layer on electrodeposited Al–W alloy coatings by selective dissolution and heat treatment Higashino, Shota; Miyake, Masao; Ikenoue, Takumi; Hirato, Tetsuji (2019-11-05) Scientific Reports, 9
Mist CVD of vanadium dioxide thin films with excellent thermochromic properties using a water-based precursor solution Matamura, Yuya; Ikenoue, Takumi; Miyake, Masao; Hirato, Tetsuji (2021-09) Solar Energy Materials and Solar Cells, 230
Columnar Grain Growth of Lead-Free Double Perovskite Using Mist Deposition Method for Sensitive X-ray Detectors Haruta, Yuki; Wada, Shinji; Ikenoue, Takumi; Miyake, Masao; Hirato, Tetsuji (2021-07) Crystal Growth & Design, 21(7): 4030-4037
Growth and Electrical Properties of Epitaxial ZnO Films Prepared by Chemical Bath Deposition Using a Flow Reactor Miyake, Masao; Yamamoto, Ken; Ikenoue, Takumi; Hirato, Tetsuji (2018-11-01) Materials Transactions, 59(11): 1761-1766
Fabrication and mechanical properties of tungsten carbide thin films via mist chemical vapor deposition Ikenoue, Takumi; Yoshida, Takuji; Miyake, Masao; Kasada, Ryuta; Hirato, Tetsuji (2020-07-05) Journal of Alloys and Compounds, 829
Epitaxial Growth and Bandgap Control of Ni1-xMgxO Thin Film Grown by Mist Chemical Vapor Deposition Method Ikenoue, Takumi; Yoneya, Satoshi; Miyake, Masao; Hirato, Tetsuji (2020) MRS Advances, 5(31-32): 1705-1712
Fabrication of (101)-oriented CsPbBr₃ thick films with high carrier mobility using a mist deposition method Haruta, Yuki; Ikenoue, Takumi; Miyake, Masao; Hirato, Tetsuji (2019-08-01) Applied Physics Express, 12(8)
Epitaxial growth of undoped and Li-doped NiO thin films on α-Al2O3 substrates by mist chemical vapor deposition Ikenoue, Takumi; Inoue, Junki; Miyake, Masao; Hirato, Tetsuji (2019-02-01) Journal of Crystal Growth, 507: 379-383
Fabrication of CsPbBr₃ Thick Films by Using a Mist Deposition Method for Highly Sensitive X-ray Detection Haruta, Yuki; Ikenoue, Takumi; Miyake, Masao; Hirato, Tetsuji (2020-01-13) MRS Advances, 5(8-9): 395-401
Hole mobility improvement in Cu2O thin films prepared by the mist CVD method Ikenoue, Takumi; Kawai, Toshikazu; Wakashima, Ryo; Miyake, Masao; Hirato, Tetsuji (2019-05) Applied Physics Express, 12(5)