検索


適用済条件:


検索をやり直す
検索条件の追加:

検索条件を追加することで検索結果を絞り込むことができます。


検索結果表示: 1-10 / 17.
検索結果:
書誌情報ファイル
Interface properties in metal-oxide-semiconductor structures on n-type 4H-SiC(03(3)over-bar8)
  Yano, H; Hirao, T; Kimoto, T; Matsunami, H; Shiomi, H (2002-12-16)
  Applied Physics Letters, 81(25): 4772-4774
file type icon 
Shallow states at SiO2/4H-SiC interface on (11(2)over-bar-0) and (0001) faces
  Yano, H; Kimoto, T; Matsunami, H (2002-07-08)
  Applied Physics Letters, 81(2): 301-303
file type icon 
MOSFET performance of 4H-, 6H-, and 15R-SiC processed by dry and wet oxidation
  Yano, H; Kimoto, T; Matsunami, H; Bassler, M; Pensl, G (2000)
  SILICON CARBIDE AND RELATED MATERIALS - 1999 PTS, 1 & 2, 338-3: 1109-1112
High channel mobility in inversion layer of SiC MOSFETs for power switching transistors
  Yano, H; Hirao, T; Kimoto, T; Matsunami, H (2000)
  JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 39(4B): 2008-2011
Interface properties in metal-oxide-semiconductor structures on n-type 4H-SiC(03(3)over-bar8)
  Yano, H; Hirao, T; Kimoto, T; Matsunami, H; Shiomi, H (2002)
  APPLIED PHYSICS LETTERS, 81(25): 4772-4774
SiC MISFETs with MBE-grown AlN gate dielectric
  Zetterling, CM; Ostling, M; Yano, H; Kimoto, T; Matsunami, H; Linthicum, K; Davis, RF (2000)
  SILICON CARBIDE AND RELATED MATERIALS - 1999 PTS, 1 & 2, 338-3: 1315-1318
Effects of wet oxidation/anneal on interface properties of thermally oxidized SiO2/SiC MOS system and MOSFET's
  Yano, H; Katafuchi, F; Kimoto, T; Matsunami, H (1999)
  IEEE TRANSACTIONS ON ELECTRON DEVICES, 46(3): 504-510
Effects of wet oxidation/anneal on interface properties of thermally oxidized SiO2/SiC MOS system and MOSFET's
  Yano, H; Katafuchi, F; Kimoto, T; Matsunami, H (1999-03)
  IEEE TRANSACTIONS ON ELECTRON DEVICES, 46(3): 504-510
file type icon 
Chemical vapor deposition and deep level analyses of 4H-SiC(11(2)over-bar0)
  Kimoto, T; Yamamoto, T; Chen, ZY; Yano, H; Matsunami, H (2001)
  JOURNAL OF APPLIED PHYSICS, 89(11): 6105-6109
4H-and 6H-SiC MOSFETs fabricated on sloped sidewalls formed by molten KOH etching
  Wahab, Q; Kosugi, H; Yano, H; Hallin, C; Kimoto, T; Matsunami, H (2002)
  SILICON CARBIDE AND RELATED MATERIALS 2001, PTS 1 AND 2, PROCEEDINGS, 389-3: 1215-1218